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Australian Research Council

Department of State and Regional Development

 

Centre of Excellence 
              in Advanced Silicon 
              Photovoltaics & 
              Photonics

 

Thin Film Group

ALICE, a Novel Poly-Si on Glass PV Technology

In the ALICIA solar cell, the absorber material is directly grown as crystalline silicon, using Si epitaxy at about 600°C by ion-assisted deposition. One difficulty in the ALICIA approach is to maintain a contamination-free initial growth surface prior to the start of epitaxy. We use hydrogen termination of the initial growth surface, whereby a well-controlled sample heating procedure is required to ensure that the hydrogen does not desorb from the initial growth surface before Si epitaxy starts.

In 2003, we developed and patented an alternative approach that avoids the problem of a contaminated initial growth surface [1,2]. The idea is to deposit the solar cell absorber material onto the hydrogen-terminated seed layer at low temperature (~200°C) as amorphous material and then to crystallise the amorphous material in a subsequent thermal anneal at elevated temperature (about 600°C). This method is related to solid-phase crystallisation (SPC), however, because of the presence of a crystalline seed layer, it is actually a solid-phase epitaxy (SPE) process. The resulting devices are thus termed ALICE solar cells (aluminium-induced crystallisation, solid-phase epitaxy). The key feature in the ALICE process is a crystallographic transferral of information during a thermal annealing step from a crystalline layer (e.g., an AIC poly-Si seed layer on glass) into another, non-crystalline layer (e.g., an a-Si layer). The non-crystalline layer crystallizes epitaxially on the crystalline seed layer during the anneal step.

Cross-sectional Schematic representation of the precursor structure for the ALICE process

The a-Si is deposited by a beam evaporation onto an oxide-free, hydrogen-terminated, smooth AIC poly-Si film on glass. The precursor formation is followed by an in-situ vacuum anneal, whereby the a-Si crystallises via solid phase epitaxy (SPE) on the AIC poly-Si layer.

A cross-sectional TEM image of an ALICE solar cell is shown below. This image confirms that a crystallographic transferral of information has taken place from the AIC seed layer into the SPE film. Defects are visible, especially along the interface, however, regions that are virtually free of defects are also visible.

Bright-field, cross-sectional TEM image of an ALICE poly-Si solar cell on glass (0.5µm scale).

ALICE is a promising novel poly-Si on glass thin-film PV technology. Current work on ALICE solar cells focuses on the improvement of the open-circuit voltage (currently 350 mV) and the fabrication of functioning Mesa-type solar cells.

[1] P.I. Widenborg, A.G. Aberle, A. Straub, N.-P. Harder, D.H. Neuhaus and O. Nast-Hartley, Fabrication method for crystalline semiconductor films on foreign substrates, International PCT patent application PCT/AU03/01313 (7 Oct 2003).
[2] P.I. Widenborg, A. Straub, Y. Huang, and A.G. Aberle, “Solid phase epitaxy of a-Si on AIC poly-Si seed layers on glass substrates”, 19th European Photovoltaic Solar Energy Conference, Paris, June, 2004.

Authorised by: SPREE | UNSW Sydney NSW 2052 Australia | Enquiries: pv.labs@unsw.edu.au
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